Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition
نویسندگان
چکیده
in low-temperature chemical vapor deposition Navneet Kumar, Angel Yanguas-Gil, Scott R. Daly, Gregory S. Girolami, and John R. Abelson Department of Materials Science and Engineering, University of Illinois at Urbana Champaign, 1304 W. Green Street, Urbana, Illinois 61801, USA Department of Chemistry, University of Illinois at Urbana Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801, USA
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